Technical Description
The present invention relates to top surface roughness reduction of substrates by deposition process.
Problems Addressed
- Cumbersome Process
- Limitations of Existing Techniques
- Expensive
- Suboptimal Performance
- Lack of Scalability
Tech Features
- Simplezr Method
- Effective System
- Ease of Performance
- Reduced Roughness
- Economical & Durable
- Scalable
- Reliable Method
Target Audience
- Manufacturing & Tooling Industry
- Electronics & Semiconductor Industry
- Aerospace & Defence Sector
- Research & Development
Tech ID: P16-1824 TRL 4 Patent Status: Granted Available For Exclusive and Non-exclusive License
