Technical Description
This invention introduces a high-adhesion thin-film coating process utilizing boron-doped microcrystalline, transition, and nanocrystalline diamond layers deposited onto cobalt-depleted cemented carbide tools. This architecture minimizes interfacial graphitization and substrate delamination during the heavy-duty machining of hard and abrasive materials.
Problems Addressed
- Substrate Coating Delamination
- High Fabrication Expense
- Poor Coating Adhesion
- Interfacial Thermal Mismatch
- Interfacial Graphitization Formation
- Severe Abrasive Wear
Tech Features
- Boron-doped Graded Architecture
- Cobalt-Depleted Surface Substrate
- Hot-Filament CVD Deposition
- Inherent Stress Relaxation
- Low-Friction Top Layer
- Enhanced Coating Adhesion
Target Audience
- Cutting Tool Manufacturing Industries
- Composite Machining Sectors (CFRP Processing)
- Ceramic Processing Industries
- Aerospace Manufacturing Sectors
- Metallurgical Tooling Industries
- Research & Development
Tech ID: P23-2198 TRL 4 Patent Status: Granted Available For Exclusive and Non-exclusive License
