Maskless Reactive Ion Etching Nano-Textured Substrates for Adulterated Food

Technical Description

The invention is a sequential maskless reactive ion etching (RIE) technique that produces flexible Surface Enhanced Raman Spectroscopy (SERS) substrates for trace-level detection of food adulterants. By executing multi-step gas etching sequences on spin-coated polydimethylsiloxane (PDMS) and grafting synthesized gold nanoparticles, it forces an in-situ capillary drying mechanism. This generates crack-free micro-wrinkles and nano-grass structures that create dense electromagnetic hotspots, enabling single-molecule event tracking at ultra-low Atto molar concentrations.

Problems Addressed

  • Lower Detection Sensitivity
  • Restricted Tracking Ranges
  • Time-Consuming Sample Preparation
  • Inability to Control Crack-free Wrinkle Variations
  • High Equipment Costs and Stationary Limitations

Tech Features

  • Sequential Maskless RIE Processing
  • Plasmonic Ag-Nanoparticle PDMS Matrix
  • Enhanced Raman Peak Signal
  • Single-Molecular Level Detection Sensitivity(10⁻⁶ to 10⁻¹⁸ M)
  • Physiochemical Skin Optical Tuning
  • 7.5 × 10⁷ Enhancement Factor of Signal Intensity
  • Portable Rapid Food Testing
  • Stress-Controlled Structural Transitions
  • ultra-dense 0.1 to 5 nm sensing junctions

Target Audience

  • Food Safety & Field Testing
  • Pharma QC & Clinical Bio-Labs
  • Agrochemical & Environmental Monitoring
Tech ID: P20-2129 TRL 4 Patent Status: Published Available For Exclusive and Non-exclusive License
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P20-2129

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Contact For Licensing

Lalit Ambastha

+91- 9811367838

Dr. Medha Kaushik

+91- 6359777555

tech@ipbazzaar.com

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